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EM Resist SML Series e-beam Resists and PMMA


EM SML Series are positive tone e-beam resists featuring high sensitivity and ultra-high resolution. These resists feature a novel, low etch rate polymer and imaging at up to 50:1 aspect ratios. Available viscosities cover a coated thickness range of approximately 50 to > 3,000nm.

Also available are PMMA resins ranging in molecular weight from 35K to 950K. Click the e-mail link below or contact your IMM representative for further information on PMMA and ancillary processing materials.


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Typical Process

Soft Bake: 180C (120s) Expose: e-beam                 PEB: None                    Develop: Puddle or immersion                      Developer: MIBK:IPA (1:3)

5nm Lines in SML 50 5nm spaces in SML 50               50nm film thickness              30keV e-beam exposure